Journal of Vacuum Science and Technology 2011 Issue 3 Influence of Ne-Xe Gas Mixture on Discharge of Shadow Mask Plasma Display Panels

Influence of Ne-Xe Gas Mixture on Discharge of Shadow Mask Plasma Display Panels
Zhu Di;Zhang Xiong;Fan Zhaowen;Yang Lanlan;Tu Yan;Li Qing;Kuang Yawei;Wang Baoping

..............page:330-335

Growth and Characterization of Indium-Tin-Oxide Films by Energy Filtered DC Magnetron Sputtering
Yao Ning;Chang Lihong;Han Changbao;Xing Hongwei;Ge Yashuang;Cui Nana;Wang Yingjian;Zhang Binglin

..............page:278-282

Optimization of Luminance and Luminous Efficiency of Mercury-Free Flat Fluorescent Lamps
Liu Zhen;Hu Wenbo;Sun Yongkui;Liu Chunliang

..............page:309-313

Evaluation of High Temperature Outgassing Rates of Stainless Steel in Method of Switching between Two Pumping Paths
Guo Dizhou;Zhang Junhui;Meng Jun;Yang Xiaotian;Luo Cheng;Yang Weishun;Zhao Yugang;Hu Zhenjun;Hou Shengjun

..............page:368-371

Novel Power Supplies for Plasma Implantation by Direct Coupling of RF and 40 kV Pulsed Voltages
Gong Chunzhi;Tian Xiubo;Zhu Zongtao;Yang Shiqin

..............page:357-361

Surface Modification of Aerospace Flywheel-Bearings by Nitrogen Plasma Immersion Ion Implantation
Li Zhaoguang;Zhang Renji;Yang Yu;Wang Langping

..............page:326-329

Electron Trajectories in High-Harmonic Slotted Peniotron
Zhao Xiaoyun;Li Jiayin;Hu Biao;Wu Xinhui;Li Tianming

..............page:297-304

Comparison of Address Voltage Margins under Two Novel Driving Waveforms in Shallow Mask Plasma Display Panels
Yang Cheng;Zhang Xiong;Wu Zhong;Fan Zhaowen;Ruan Guifu

..............page:314-319

Sputtering Power and Microstructures of RF Reactively Sputtered Ag2O Films
Ma Jiaomin;Liang Yan;Gao Xiaoyong

..............page:283-286

Influence of Substrates on Hydrogenated Si Films Grown by Plasma Enhanced Chemical Vapor Deposition
Wang Quan;Hu Ran;Ding Jianning;He Yuliang

..............page:267-271

Growth and Stress Distributions of Negative Thermal Expansion ZrW2O8 Films Deposited by RF Magnetron Sputtering
Liu Hongfei;Zhang Zhiping;Zhang Wei;Chen Xiaobing;Cheng Xiaonong

..............page:253-257

Polishing of B-Doped Diamond Films by Electrical Discharge Machining
Chu Xiangqian;Zuo Dunwen

..............page:287-291

Influence of C2H2 Flow Rate on Microstructures and Electronic Properties of SiCN Diffusion Barriers
Zhang Zhichao;Zhou Jicheng;Peng Yinqiao

..............page:272-277

Molecular Dynamics Simulation of Energy Dependence of SiF2 and SiC Interaction
Zhao Chengli;Qin Youmin;Lü Xiaodan;Ning Jianping;He Pingni;Gou Fujun

..............page:376-380

Influence of Substrate Material on Growth of ZnS Films
Xu Junqi;Su Junhong;Liang Haifeng;Xi Yingxue

..............page:262-266

Characterization of Highly-Aligned ZnO Nanowire Arrays and Its Application in Humidity Sensors
Gu Leilei;Zheng Kaibo;Sun Dalin;Mo Xiaoliang;Chen Guorong

..............page:352-356

Damages on Titanium Alloy Surfaces Induced by Intense Pulsed Ion Beam Bombardment
Li Mingjuan;Liu Weibo

..............page:372-375

Emission Characteristics of 411 Aluminates in Ba-W Cathode
Tang Zhilan;Shen Chunying;Li Zhishun;Qiu Tai

..............page:305-308

Molecular Dynamics Simulation of H-Etching of Hydrocarbon Films in Fusion Reactor
Lü Xiaodan;Qin Youmin;Zhao Chengli;Ning Jianping;He Pingni;Gou Fujun

..............page:320-325

The Carbothermic Reduction Process for Magnesium Removal from Nickel Laterite in Vacuum
Xu Baoqiang;PEI Hongbin;Yang Bin;Liu Dachun;Qu Tao;Dai Yongnian

..............page:341-347

Growth and Oxidation Resistance of ZnO∶Sn/Ag/ZnO∶Sn Composite Film Electrodes
Li Yu;Yuan Junlin;Weng Weixiang;Wu Chaoxing;Jia Zhen;Guo Tailiang

..............page:258-261

Improvement of Magnetic Fluid Sealing of Film Depositors with Double Shafts
Xing Feifei;Li Decai

..............page:362-367

Characterization of Superfine Copper Powders Grown By Vacuum Evaporation
Shi Shengdian;Yang Bin;Xu Baoqiang;Xiong Heng;Dai Yongnian

..............page:336-340

Thermoelectric Property of Different Thickness ZnO Films Grown by Gas Discharge Activated Reaction Evaporation
Sun Haitao;Li Chengwu;Lu Hui;Fang Bin;Lin Xian;Wang Yannan;Pan Xiaoren

..............page:292-296

Corrosion Resistance Enhancement of Ceramic Membranes Deposited by Chemical Vapor Deposition
Huang Bensheng;Xue Qi;Jiang Zhongying;Liu Qingyou

..............page:348-351