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Journal of Vacuum Science and Technology
1672-7126
2005 Issue 1
zhong guo zhen kong xue hui zhen kong ke xue yu ji shu xue bao zu jie
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page:插4
Development and Applications of A New Si Electron Beam Evaporator
Wang Kefan;LIU Jinfeng;Zou Chongwen;XU Pengshou;Pan Haibin;Zhang Xigeng;Wang Wenjun
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page:75-78
Growth of TiN Film by Modified Ion Beam Enhanced Magnetron Sputtering
Dong Qi;Luo Rongping;Zhang Shouzhong;Du Jian;ZHONG Gang;TIAN Kai;Wen Xuechun;Liu Xiangwu
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page:69-74
Influence of Total Gas Pressure on Optical Property of TiO2 Thin Film Grown by DC Reactive Magnetron Sputtering
Wang Hequan;Ba Dechun;Shen Hui;Wang Baowei;WEN Lishi
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page:65-68
Influence of N2 Partial Pressure on Microstructure and Mechanical Properties of Reactively Sputtered (Ti,Al)N Films
Mei Fanghua;SHAO Nan;Wei Lun;Li Geyang
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page:61-64
Al-induced Crystallization of Hydrogenated Amorphous Silicon Films
Qi Jing;Jin Jing;Hu Hailong;HE Deyan
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page:57-60
Preferred Crystal Orientation of Mg-Zr-O Composite Protective Layer Prepared by E-beam Evaporation
Guo Bingang;LIU Chunliang;Liu Liu;Fan Yufeng;Xia Xing
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page:53-56
Influence of Sb Dopant in TiO2 Film Growth by DC Reactive Magnetron Sputtering
Cai Zhenwei;Wo Songtao;Shen Jie;Cui Xiaoli;Yu Hongkun;Yang Xiliang;Zhang Zhuangjian
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page:50-52
Development of 2nd Generation Proximity Focus Image Intensifier with Nano Second Response
Xu Jiangtao
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page:47-49
Development of Diamond-Like Carbon Coating Technology for Magnetic Storage Disk
Ding Wanyu;Gao Peng;Deng Xinlu;DONG Chuang;Xu Jun
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page:41-46,49
Formation of Nano-Grains in Amorphous Co-Nb-Zr Films and Its Magnetic Properties
Jiang Xiangdong;Zhang Huaiwu;WEN QiYe;Shi Yu
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page:37-40
Photocatalytic Ag-TiO2 Thin Films Prepared by RF Magnetron Co-Sputtering
Shen Jie;Cai Zhenwei;Wo Songtao;Cui Xiaoli;Ren Dasen;Yang Xiliang;Zhang Zhuangjian
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page:33-36
Silicon Carbide Nanowires Synthesized by Arc Discharge
Wu Xufeng;Ling Yiming
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page:30-32
Atomic Force Microscopy Study of Bismuth Films and Its Electrical Properties
Xu Jianfeng;Zhang Jianhua;Li Haiyang;He Pimo;Bao Shining
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page:26-29
Low Throughput Calibration by Constant Volume and Conductance Technique
Zhang Dixin;Guo Meiru;Feng Yan;Zhao Lan;Li Detian;Zhao Dingzhong;Li Zhenghai;Cheng Yongjun;Li Li;Gong Yueli;SUN Hai
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page:21-25
Simulation of X-ray Lithography Mask Distortion in Device Fabrication
Wang Yongkun;Yu Jianzu;Yu Lei
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page:18-20,29
Measurement of Characteristics Parameters of AC Plasma Display Panel
Liang Zhihu;LIU Chunliang;Liu Zujun
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page:14-17
Interfacial Strain in Heteroepitaxial Growth of MgO/STO Thin Film
ZHENG Liang;Zhang Ying;Li Jinlong;Jiang Shuwen;Ji Hong;Ai Wanyong;CHEN Yin;LI Yanrong
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page:10-13
Influence of Electrode on Discharge Characteristics in Newly-Developed Shadow-Mask Plasma-Display Panel:a Simulation Study
Zhang Jian;Tu Yan;Yin Hanchun
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page:4-9
Photoemission Spectroscopy Studies of Tetracene Overlayer on Ag(110)
Tao yongsheng;Zhang Hanjie;Lü Bin;HUANG Han;Li Haiyang;Bao Shining;He Pimo
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page:1-3,17