Improved multilevel filters to enhance infrared small target
Xiaoping Wang 1; Tianxu Zhang 1; Luxin Yan 1 ; Man Wang 1 ; and Jiawei Wu ) 2 1 Institute for Pattern Recognition and Artificial Intelligence; Huazhong University of Science and Technology; Wuhan 430074; China 2 School of Electronic Information Engineering; Beihang University; Beijing 100191; China
..............page:27-29
Efficient two-photon sensitized luminescence of europium (Ⅲ) complex based on hypersensitive transitions
Meng Shi1*;Hua Li 2;Mei Pan 3;Fufang Su1; Lili Ma1;Peigao Han1;and Hezhou Wang 4 1 Shandong Provincial Key Laboratory of Laser Polarization and Information Technology; Laser Institute; Qufu Normal University; Qufu 273165; China 2 Xingtan College; Qufu Normal University; Qufu 273165; China 3School of Chemistry and Chemical Engineering; Sun Yat-Sen University; Guangzhou 510275; China 4School of Physics and Engineenng; Sun Yat-Sen University; State Key Laboratory of Optoelectronic Materials and Technologies; Guangzhou 510275; China
..............page:56-58
Femtosecond pulses cleaning by transient-grating process in Kerr-optical media
Jun Liu 1;2;3; Kotaro Okamura 1;2; Yuichiro Kida 1;2; and Takayoshi Kobayashi 1;2;4;5 1 Advanced Ultrafast Laser Research Center; and Department of Engineering Science; Faculty of Informatics and Engineering; Department of Engineering Science; The University of Electro-Communications;1-5-1; Chofugaoka; Chofu; Tokyo 182-8585; Japan 2 International Cooperative Research Project ; Japan Science and Technology Agency; 4-1-8 Honcho; Kawaguchi; Saitama 332-0012; Japan 3 State Key Laboratory of High Field Laser Physics; Shanghai Institute of Optics and Fine Mechanics; Chinese Academy of Sciences; Shanghai 201800; China 4 Department of Electrophysics; National Chiao Tung University; 1001 Ta Hsueh Rd. Hsinchu 300; China 5 Institute of Laser Engineering; Osaka University; Yamadakami 2-6; Suita; Osaka 565-0871; Japan
..............page:63-65
Optical design for EUV lithography source collector
Shuqing Zhang 1 ; Qi Wang 2 ; Dongyuan Zhu 1 ; Runshun Li 1 ; and Chang Liu 3 1 Research Center for Space Optical Engineering; Harbin Institute of Technology; Harbin 150080; China 2 Institute of Opto-Electronics; Harbin Institute of Technology; Harbin 150080; China 3 Center for Composite Material; Harbin Institute of Technology; Harbin 150080; China
..............page:66-69
Accurate analysis of ellipsometric data for thick transparent films
Yuan Zhao 1;2 ; Mingyu Sheng 1;3 ; Yuxiang Zheng 1 ; and Liangyao Chen 1 1 Department of Optical Science and Engineering; Fudan University; Shanghai 200433; China 2 Department of Optical Electronics Information Engineering; Shanghai Second Polytechnic University; Shanghai 201209; China 3 Department of Electronics Information Engineering; Shanghai Business School; Shanghai 200235; China
..............page:81-84