1671-4776
2015 Issue 9
Research Process of Tunnel Junction Models in Ⅲ-Ⅴ Multi-Junction Solar Cells
Chen Shuai;Yang Ruixia;Wu Yamei;School of Electronics and Information Engineering;Hebei University of Technology;
Chen Shuai;Yang Ruixia;Wu Yamei;School of Electronics and Information Engineering;Hebei University of Technology;
..............page:545-553
Effect of the Surface Morphology of the PMMA Gate Insulating Layer on the Performance of the Pentacene-Based OTFT
Li Xuefei;Wang Wei;Wang Shuai;Shi Xiaodong;Institute Microelectronics;School of Electronics and Information Engineering;Hebei University of Technology;
Li Xuefei;Wang Wei;Wang Shuai;Shi Xiaodong;Institute Microelectronics;School of Electronics and Information Engineering;Hebei University of Technology;
..............page:554-558+580
Effect of the Double Fano Resonances in the Gold Nanorod Composite Structure
Qi Xin;Huang Yunhuan;Xue Baoping;College of Physics and Optoelectronics;Taiyuan University of Technology;Key Laboratory of Advanced Transducers and Intelligent Control System of Ministry of Education;Taiyuan University of Technology;
Qi Xin;Huang Yunhuan;Xue Baoping;College of Physics and Optoelectronics;Taiyuan University of Technology;Key Laboratory of Advanced Transducers and Intelligent Control System of Ministry of Education;Taiyuan University of Technology;
..............page:559-564
Combined MEMS 3D Vector Acoustic Sensors
Guo Nan;Zhang Guojun;Liu Mengran;Jian Zeming;Zhang Wendong;Key Laboratory of Instrumentation Science and Dynamic Measurement of Ministry of Education;North University of China;Key Laboratory of Science and Technology on Electronic Test & Measurement;North University of China;
Guo Nan;Zhang Guojun;Liu Mengran;Jian Zeming;Zhang Wendong;Key Laboratory of Instrumentation Science and Dynamic Measurement of Ministry of Education;North University of China;Key Laboratory of Science and Technology on Electronic Test & Measurement;North University of China;
..............page:565-569+596
Numerical Simulation of the Electroosmotic Flow of Power-Law Fluids in Microchannels Based on the PNP Model
Shen Li;Li Ming;Yang Dayong;School of Mechatronics Engineering;Nanchang University;School of Information Engineering;Nanchang University;
Shen Li;Li Ming;Yang Dayong;School of Mechatronics Engineering;Nanchang University;School of Information Engineering;Nanchang University;
..............page:570-575
Formation Mechanism of the Micro Droplet Based on the Flow-Focusing Structure
Yang Li;Zhou Wei;Wang Xuehao;Cheng Jingmeng;Wang Yuanyuan;Zhang Sixiang;Reserch Institute of Modern Measurement and Control Technology;Hebei University of Technology;
Yang Li;Zhou Wei;Wang Xuehao;Cheng Jingmeng;Wang Yuanyuan;Zhang Sixiang;Reserch Institute of Modern Measurement and Control Technology;Hebei University of Technology;
..............page:576-580
Preparation and Flip-Chip Bonding of a High Temperature Piezoresistive Pressure Sensor
Li Dandan;Liang Ting;Yao Zong;Li Sainan;Xiong Jijun;Key Laboratory of Science and Technology on Electronic Test and Measurement;North University of China;Key Laboratory of Instrumentation Science and Dynamic Measurement of Ministry of Education;North University of China;
Li Dandan;Liang Ting;Yao Zong;Li Sainan;Xiong Jijun;Key Laboratory of Science and Technology on Electronic Test and Measurement;North University of China;Key Laboratory of Instrumentation Science and Dynamic Measurement of Ministry of Education;North University of China;
..............page:581-585
White Light Interference Measuring System Based on the Wavelet Envelope Extraction Method
Jian Li;Lei Lihua;Li Dongsheng;Sun Xiaoguang;Cai Xiaoyu;Li Yuan;College of Metrology and Measurement Engineering;China Jiliang University;Laboratory of Micro/Nano Measurement;Shanghai Institute of Measurement and Testing Technology;
Jian Li;Lei Lihua;Li Dongsheng;Sun Xiaoguang;Cai Xiaoyu;Li Yuan;College of Metrology and Measurement Engineering;China Jiliang University;Laboratory of Micro/Nano Measurement;Shanghai Institute of Measurement and Testing Technology;
..............page:586-591+610
Effect of the Surfactant in the Alkaline Copper Precise Polishing Slurry on the Planarization
Jia Shaohua;Liu Yuling;Wang Chenwei;Yan Chenqi;Institute of Microelectronics;Hebei University of Technology;
Jia Shaohua;Liu Yuling;Wang Chenwei;Yan Chenqi;Institute of Microelectronics;Hebei University of Technology;
..............page:592-596
Study of the Frequency Selective Surface by Using UV-LIGA Technique
Lin Binbin;Chen Di;Lin Shujing;Xie Yao;Yuan Tao;Cui Daxiang;Key Lab for Thin Film and Microfabrication Technology of Ministry of Education;Department of Instrument Science and Engineering;School of Electronic Information and Electrical Engineering;Shanghai Jiao Tong University;
Lin Binbin;Chen Di;Lin Shujing;Xie Yao;Yuan Tao;Cui Daxiang;Key Lab for Thin Film and Microfabrication Technology of Ministry of Education;Department of Instrument Science and Engineering;School of Electronic Information and Electrical Engineering;Shanghai Jiao Tong University;
..............page:597-602
Effect of Alkaline ChelatingAgent FA/O II on the Polishing Qualityin the Barrier CMP
Rong Yingjia;Wang Shengli;Liu Yuling;Wang Chenwei;Gao Jiaojiao;Zhang Wenqian;Institute of Microelectronics;Hebei University of Technology;
Rong Yingjia;Wang Shengli;Liu Yuling;Wang Chenwei;Gao Jiaojiao;Zhang Wenqian;Institute of Microelectronics;Hebei University of Technology;
..............page:603-610
..............page:611-612