Polymethylacrylic Acid Grafted on the Surface of Carbon Microbeads by Photoinitiation
liu wei feng ; han yan xing ; guo ming cong ; yang yong zhen ; liu xu guang ; xu bing she

..............page:475-479

Status and Development Trend of Organic Semiconductor Devices
chen hai ming ; jin bao shan

..............page:470-474

Research on Wet Etching of Bismuth Based Cubic Pyrochlore Films
gao li bin ; li ru guan ; jiang shu wen ; li yan rong

..............page:499-502

Quality Control of Semiconductor Device Process by SPC Technique
wang wen jun

..............page:518-521

Research on Distribution of Power FETs with Large Gate Width
fang jia xing ; hu zhi fu ; cai shu jun

..............page:513-517

Logic Circuits Composed by CMOS NDR Elements and Their Development Prospect
guo wei lian ; niu ping juan ; li xiao yun ; liu hong wei ; gu xiao ; mao lu hong ; zhang shi lin ; chen yan ; wang wei

..............page:461-469,506

Progress of Ni-Mn-Ga Ferromagnetic Shape Memory Films
chen feng hua ; zhang min gang ; chai yue sheng ; zhang zhen zhen

..............page:480-483

Estimate Method of MEMS Gyroscope Performance Based on Allan Variance
zou xue feng ; lu xin yan

..............page:490-493,498

Focusing and Leveling in Dual-Stage Lithographic Systems
li jin long ; zhao li xin ; hu song ; zhou shao lin

..............page:494-498

Highly Accelerated Stress Test of High Density Packaging ICs
zhang shan lun ; lai ping ; yao bin ; liu jian ; li bin

..............page:507-512

System-Level Modeling Method of Variable Cross-Section Beams
hao xing ; yuan wei zheng ; chang hong long ; niu zuo bin ; jiao wen long

..............page:484-489,502

ICP Etching for GaAs p-i-n Process
zhang li jiang ; zuo jin qiang ; cui yu xing ; fu xing chang

..............page:503-506

xin xi dong tai

..............page:522-524