1671-4776
2009 Issue 1
..............page:插1
..............page:1-9
..............page:10-15
Facet Treatment of High-Power Semiconductor Laser Diodes
Hua Jizhen;Qi Zhihua;Yang Hongwei;Du Weihua;Chen Guoying
Hua Jizhen;Qi Zhihua;Yang Hongwei;Du Weihua;Chen Guoying
..............page:16-22
Preparation and Effect of Nanometer Mn3O4 by Oxidation Precipitation Method
Suo Liumin;Hua Ning;Han Ying;Kang Xueya
Suo Liumin;Hua Ning;Han Ying;Kang Xueya
..............page:23-28
Effect of Reactants Quantity on Nanostructure and Mechanical Properties of Bulk Nanocrystalline Fe3Al
La Peiqing;Wang Li;Cheng Chunjie;Zhao Yang;Yang Yang
La Peiqing;Wang Li;Cheng Chunjie;Zhao Yang;Yang Yang
..............page:29-33
Development of Structural Design and Simulation Analysis for Dielectrophoresis Microchips
Zeng Xue;Xu Yi;Cao Qiang;Hao Dunling;Wu Yongjie
Zeng Xue;Xu Yi;Cao Qiang;Hao Dunling;Wu Yongjie
..............page:34-40
Research on Microchannel Fabrication of PCR Chip by Electron Beam Lithography Based on Overlapped Scanning
Kong Xiangdong;Feng Shengyu;Zhang Yulin
Kong Xiangdong;Feng Shengyu;Zhang Yulin
..............page:41-44
Si2Sb2Te5 Based Ultra-High-Density PCRAM Arrays Fabricated by UV-IL
Liu Yanbo;Min Guoquan;Song Zhitang;Zhou Weimin;Zhang Jing;Zhang Ting;Wan Yongzhong;Li Xiaoli;Zhang Jianping
Liu Yanbo;Min Guoquan;Song Zhitang;Zhou Weimin;Zhang Jing;Zhang Ting;Wan Yongzhong;Li Xiaoli;Zhang Jianping
..............page:45-49
Analysis of Influencing Factors of Sapphire Substrate CMP Removal Rate
Zong Simiao;Liu Yuling;Niu Xinhuan;Li Xianzhen;Zhang Wei
Zong Simiao;Liu Yuling;Niu Xinhuan;Li Xianzhen;Zhang Wei
..............page:50-54
Simulation of Low-Energy Electron Scattering in Electron Beam Exposure
Luo Xiaobin;Yu Zhaoxian
Luo Xiaobin;Yu Zhaoxian
..............page:55-59