Micronanoelectronic Technology 2008 Issue 2 wei na dian zi ji shu zheng gao qi shi

Journals A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

Micronanoelectronic Technology
1671-4776
2008 Issue 2

..............page:封4

..............page:125

International Focus

..............page:123-124

..............page:118-122

Study of Mg Alloy Polishing Mechanism and CMP Technology
Chen Jing;Liu Yuling;Wang Xiaoyun;Wang Lifa;Ma Zhenguo;Wu Yahong

..............page:114-117,122

Effects of Fabrication Methods on Porous Anodic Aluminum Oxide Templates
Fu linjie;Li meiya;Wang jing;Jiang hua;Guo dongyun

..............page:109-113

Microfabricated Capacitive Vacuum Sensor Based on MEMS
Zhang Dan;Lin Yanfei;Feng Yongjian

..............page:104-108

..............page:100-103

..............page:97-99,113

Properties and applications of Ge nanowires
Pei Lizhai;Tan Wei;Zhao Haisheng;Yu Haiyun

..............page:91-96,108

..............page:87-90

GaN Nanorods Grown by Magnetron Sputtering and Ammoniating Technology and Its Characteristic
Xue Chengshan;Chen Jinhua;Zhuang Huizhao;Qin Lixia;Li Hong;Yang Zhaozhu;Wang Zouping

..............page:83-86

Process Research of Preparing Single-Walled CNTFET
Huang gaiyan;Chen changxin;Zhang yafei

..............page:78-82

Study on SOI CMOS Devices
Yan zhiying;Dou weimin;Hu diqing

..............page:74-77

Study on Electronic Conductance of C20 Fullerence with Defect
Zhang Hongyu;Wang Liguang;Li Yong;Yu Dingwen

..............page:69-73

..............page:63-68