1671-4776
2002 Issue 4
..............page:1-7
Si single-electron transistor with in-plane point-contact metal gates
sun jin peng ; wang tai hong
sun jin peng ; wang tai hong
..............page:8-10，36
Single-electron transistor and its fabrication
guo hui ; guo wei lian ; zhang shi lin ; liang hui lai
guo hui ; guo wei lian ; zhang shi lin ; liang hui lai
..............page:11-18
Influence of substrate temperature of nanocrystalline SnO2 thin films
wang zhan he ; jiang yun chen ; zhu zuo
wang zhan he ; jiang yun chen ; zhu zuo
..............page:19-21
Preparation nanometer Si clusters by RF magnetron sputtering technique
ma zhen chang ; zong wan hua ; heng cheng lin ; qin guo gang ; wu zheng long
ma zhen chang ; zong wan hua ; heng cheng lin ; qin guo gang ; wu zheng long
..............page:22-24，29
..............page:25-29
Application of DUV deep lithography in LIGA process
yu guo bin ; yao han min ; hu song ; chen xing jun
yu guo bin ; yao han min ; hu song ; chen xing jun
..............page:30-32
Prime study of an electromagnetic microrelay fabricated by UV-LIGA technology
zhang peng ; liu gang ; tian yang chao
zhang peng ; liu gang ; tian yang chao
..............page:33-36
A new type of projection electron beam lithography with angular limitation
gu wen zuo ; zhang fu an
gu wen zuo ; zhang fu an
..............page:37-41
Applications of process technology of EB direct-writing gate and T-shape gate
liu yu gui ; wang wei jun ; luo si wei ; jiang ze liu
liu yu gui ; wang wei jun ; luo si wei ; jiang ze liu
..............page:42-43
..............page:44
..............page:44-46
..............page:46-47
..............page:48