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Uniformity of TiN Films Fabricated by Hollow Cathode Discharge
JIANG Haifu~1;GONG Chunzhi~1;TIAN Xiubo~1;YANG Shiqin~1;R. K. Y. FU~2;P. K. CHU~2 1 State Key Lab. of Advanced Welding Production & Technology;School of Material Science and Engineering;Harbin Institute of Technology;Harbin 150001;China 2 Department of Physics and Materials Science;City University of Hong Kong;Tat Chee Avenue;Kowloon;Hong Kong;China
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