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Infuence of Process Parameters on the RF Sputtered GaP Thin Films
D.A. Mota;G. Hema Chandra;J. Ventura;A. Guedes;J. Pérez de la Cruz;INESC TEC;Rua do Campo Alegre n°687;IFIMUP-IN;Rua do Campo Alegre n°687;Thin Film Laboratory;Material Physics Division;VIT University;Geology Department;Faculty of Science;University of Porto;Rua do Campo Alegre n°687;
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