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Chinese Journal of Semiconductors
0253-4177
2013 Issue 3
Effects of interaction between defects on the uniformity of doping HfO2-based RRAM:a first principle study
Zhao Qiang;Zhou Maoxiu;Zhang Wei~1;Liu Qi Li Xiaofeng;Liu Ming~2;and Dai Yuehua~+ 1 School of Electronic and Information Engineering;Anhui University;Hefei 230601;China 2 Laboratory of Nano-Fabrication and Novel Device Integrated Technology;Institute of Microelectronics;Chinese Academy of Sciences;Beijing 100029;China 3 Internet Network Information Center;Institutes of Physical Science;Chinese Academy of Sciences;Hefei 230031;China
..............page:1-6
The design and test of MEMS piezoresistive ultrasonic sensor arrays
Lian Deqin~;He Changde~;Zhang Hui;Yu Jiaqi Yuan Kejing;and Xue Chenyang 1 Key Laboratory of Instrumentation Science & Dynamic Measurement;Ministry of Education;North University of China; Taiyuan 030051;China 2 Key Laboratory of Science and Technology on Electronic Test & Measurement;North University of China;Taiyuan 030051; China
..............page:51-57
Simulation study on short channel double-gate junctionless field-effect transistors
Wu Meile~1;Jin Xiaoshi;Chuai Rongyan~1;Liu Xi and Jong-Ho Lee~2 1 School of Information Science and Engineering;Shenyang University of Technology;Shenyang 110870;China 2 School of EECS Eng and ISRC;Seoul National University;Shinlim-Dong; Kwanak-Gu;Seoul 151-742;Korea
..............page:35-42
A thru-reflect-line calibration for measuring the characteristics of high power LDMOS transistors
Wang Shuai Li Ke;Jiang Yibo;Cong Mifang Du Huan;and Han Zhengsheng Institute of Microelectronics;Chinese Academy of Sciences;Beijing 100029;China
..............page:43-47
A lower power reconfigurable multi-band transceiver for short-range communication
Zhang Lingwei~;Chi Baoyong Qi Nan~1;Liu Liyuan Jiang Hanjun~1;and Wang Zhihua 1 Institute of Microelectronics;Tsinghua University;Beijing 100084;China 2 Institute of Semiconductors;Chinese Academy of Sciences;Beijing 100083;China
..............page:105-111
A digitally calibrated CMOS RMS power detector for RF automatic gain control
Yan Taotaoi;Wang Hui;Li Jinbo;and Zhou Jianjun School of Microelectronics;Shanghai Jiao Tong University;Shanghai 200240;China
..............page:63-69
High linearity current communicating passive mixer employing a simple resistor bias
Liu Rongjiang;Guo Guiliang;and Yan Yuepeng Department of Electronics System Technology;Institute of Microelectronics;Chinese Academy of Sciences; Beijing 100029;China
..............page:86-89
A 27-mW 10-bit 125-MSPS charge domain pipelined ADC with a PVT insensitive boosted charge transfer circuit
Chen Zhenhai~;Huang Songren~2;Zhang Hong Yu Zongguang~2;and Ji Huicai 1 Wide Bandgap Semiconductor Technology Disciplines State Key Laboratory;School of Microelectronics;Xidian University; Xi’an 710071;China 2 China Electronic Technology Group Corporation;No.58 Research Institute;Wuxi 214035;China 3 School of Electronics and Information Engineering;Xi’an Jiaotong University;Xi’an 710049;China
..............page:112-120
An 8-bit 100-MS/s digital-to-skew converter embedded switch with a 200-ps range for time-interleaved sampling
Zhu Xiaoshi;Chen Chixiao;Xu Jialiang~1;Ye Fan and Ren Junyan 1 State Key Laboratory of ASIC & System;Fudan University;Shanghai 201203;China 2 Microelectronics Science and Technology Innovation Platform;Fudan University;Shanghai 201203;China
..............page:76-80
A saw-less direct conversion long term evolution receiver with 25% duty-cycle LO in 130 nm CMOS technology
He Siyuan~+;Zhang Changhong~1;Tao Liang~1;Zhang Weifeng Zeng Longyue;L Wei;and Wu Haijun 1 Guangzhou Runxin Information Technology Co.Ltd.Guangzhou 510663;China 2 School of Electronic and Information Engineering;South China University of Technology;Guangzhou 510641;China
..............page:70-75
Photoconductivity and surface chemical analysis of ZnO thin films deposited by solution-processing techniques for nano and microstructure fabrication
V.K.Dwivedi~;P.Srivastava~2;and G.Vijaya Prakash~ 1 Nanophotonics Laboratory;Department of Physics;Indian Institute of Technology Delhi;Hauz khas;New Delhi-110 016; India 2 Nanostech Laboratory;Department of Physics;Indian Institute of Technology Delhi;Hauz khas;New Delhi-110 016;India
..............page:12-16
Effects of seed layer on the performance of microcrystalline silicon germanium solar cells
Cao Yu;Zhang Jianjun;Li Tianwei;Huang Zhenhua Ma Jun;Yang Xu;Ni Jian;Geng Xinhua and Zhao Ying Institute of Photo-Electronic Thin Film Devices and Technique of Nankai University;Key Laboratory of Photo-Electronics Thin Film Devices and Technique of Tianjin;Key Laboratory of Opto-Electronic Information Science and Technology of Ministry of Education;Tianjin 300071;China
..............page:58-62
A high-voltage SOI MOSFET with a compensation layer on the trenched buried oxide layer
Zhao Qiuming~1;Li Qi;Tang Ning~1;and Li Yongchang 1 School of Information and Communication;Guilin University of Electronic Technology;Guilin 541004;China 2 Guilin Strong Micro Electronics Co.;Ltd;Guilin 541004;China
..............page:31-34
Evaluation of planarization capability of copper slurry in the CMP process
Yin Kangda;Wang Shengli;Liu Yuling Wang Chenwei;and Li Xiang Institute of Microelectronics;Hebei University of Technology;Tianjin 300130;China
..............page:133-136
A multi-path gated ring oscillator based time-to-digital converter in 65 nm CMOS technology
Jiang Chen;Huang Yumei~+;and Hong Zhiliang State Key Laboratory of ASIC & System;Fudan University;Shanghai 201203;China
..............page:81-85
A 6-7 GHz,40 dB receiver RF front-end with 4.5 dB minimum noise figure in 0.13μm CMOS for IR-UWB applications
Qin Xi;Huang Yumei;and Hong Zhiliang State Key Laboratory of ASIC and System;Fudan University;Shanghai 201203;China
..............page:90-96
Dynamic avalanche behavior of power MOSFETs and IGBTs under unclamped inductive switching conditions
Lu Jiang;Tian Xiaoli;Lu Shuojin;Zhou Hongyu Zhu Yangjun;and Han Zhengsheng Institute of Microelectronics;Chinese Academy of Sciences;Beijing 100029;China
..............page:26-30
Fabrication and characteristics of magnetic field sensors based on nano-polysilicon thin-film transistors
Zhao Xiaofeng;Wen Dianzhong;Zhuang Cuicui;Cao Jingya and Wang Zhiqiang Key Laboratory of Electronics Engineering;College of Heilongjiang Province;Heilongjiang University;Harbin 150080;China
..............page:127-132
Research on the diamond MISFET
Zhou Jianjun;Bai Song;Kong Cen;Geng Xijiao Lu Haiyan;Kong Yuechan and Chen Tangsheng Science and Technology on Monolithic Integrated Circuits and Modules Laboratory;Nanjing Electronic Devices Institute; Nanjing 210016;China
..............page:48-50
A CMOS low power,process/temperature variation tolerant RSSI with an integrated AGC loop
Lei Qianqian~;Lin Min;and Shi Yin 1 Department of Physics;Xi’an Polytechnic University;Xi’an 710048;China 2 Suzhou-CAS Semiconductors Integrated Technology Research Center;Suzhou 215021;China
..............page:97-104
Nanoindentation on the doubler plane of KDP single crystal
Guo Xiaoguang;Zhang Xiaoji;Tang Xianzhao Guo Dongming;Gao Hang;and Teng Xiaoji Key Laboratory for Precision and Non-Traditional Machining Technology of Ministry of Education;Dalian University of Technology;Dalian 116023;China
..............page:21-25
Optical properties of GaAs
J.O.Akinlami and A.O.Ashamu Department of Physics;Federal University of Agriculture;P.M.B 2240;Abeokuta;Ogun State;Nigeria
..............page:7-11
Te vapor annealing of indium-doped CdMnTe crystals
Zhang Jijun;Wang Linjun;Min Jiahua;Qin Kaifeng Shi Zhubin;and Liang Xiaoyan School of Materials Science and Engineering;Shanghai University;Shanghai 200072;China
..............page:17-20
The architecture design of a 2mW 18-bit high speed weight voltage type DAC based on dual weight resistance chain
Chen Qixing~ and Luo Qiyu 1 Hunan Urban Construction College;Changsha 410015;China 2 China National Electronics Import & Export Corp.;Beijing 100036;China
..............page:121-126