Stacking fault energy in some single crystals
Aditya M.Vora Humanities and Social Science Department;S.T.B.S.College of Diploma Engineering;Swami Atmanand Sarswati Vidya Sankul;Opp.Kapodra Police Station;Varachha Road;Surat 395 006;Gujarat;India
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A novel circuit architecture for fourth subharmonic mixers
Yao Changfei~;XuConghai~2;Zhou Ming~2; Luo Yunsheng~2 1 Science and Technology on Monolithic Integrated Circuits and Modules Laboratory;Nanjing Electronic Devices Institute; Nanjing 210016;China 2 Research Department of Microwave and Millimeter Wave Modules in Aerospace;Nanjing Electronic Devices Institute; Nanjing 210016;China
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A 150%enhancement of PMOSFET mobility using hybrid orientation
Tang Zhaohuan~;Tan Kaizhou~1;CuiWei~1;Zhang Jing~1; ZhongYi~2;Xu Shiliu~;HaoYue~3;Zhang Heming~3; Hu Huiyong~3;Zhang Zhengfan~;Hu Gangyi~2 1 Science and Technology on Analog Integrated Circuit Laboratory;Chongqing 400060;China 2 Sichuan Institute of Solid-State Circuits;China Electronics Technology Group Corp;Chongqing 400060;China 3 Key Laboratory of the Ministry of Education for Wide-Band Gap Semiconductor Materials and Devices; School of Microelectronics;Xidian University;Xi’an 710071;China
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Hot-carrier reliability in OPTVLD-LDMOS
Cheng Junji Chen Xingbi State Key Laboratory of Electronic Thin Films and Integrated Devices of China;University of Electronic Science and Technology of China;Chengdu 610054;China
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Enhancement-mode InAlN/GaN MISHEMT with low gate leakage current
GuGuodong~;Cai Yong~;Feng Zhihong~1;Liu Bo~1; Zeng Chunhong~2;Yu Guohao~2;Dong Zhihua~2; Zhang Baoshun~2 1 Science and Technology on ASIC Laboratory;Hebei Semiconductor Research Institute;Shijiazhuang 050051;China 2 Suzhou Institute of Nano-Tech and Nano-Bionics;Chinese Academy of Sciences;Suzhou 215123;China
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H-plasma-assisted aluminum induced crystallization of amorphous silicon
Li Juan~;Liu Ning~1;Luo Chong~1;Meng Zhiguo~1; Xiong Shaozhen~1;Hoi Sing Kwok~2 1 Institute of Photo-Electronics;Nankai University;Tianjin Key Laboratory for Photo-Electronic Thin Film Devices and Technology;Tianjin 300071;China 2 Department of Electronic and Computer Engineering;The Hong Kong University of Science and Technology; Clear Water Bay;Kowloon;Hong Kong;China
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