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Chinese Journal of Semiconductors
0253-4177
2008 Issue 4
An Energy Band Design for p-Type Tensile Strained Si/SiGe Quantum Well Infrared Photodetectors
Deng Heqing;Lin Guijiang;Lai Hongkai;Li Cheng;Chen Songyan;Yu Jinzhong
..............page:785-788
Charge Storage Characteristics of Nonvolatile Floating-Gate Memory Based on Gradual Ge1-xSix/Si Heteronanocrystals
Lü Jin;Chen Yubin;Zuo Zheng;Shi Yi;Pu Lin;Zheng Youdou
..............page:770-773
Emerging Challenges in ESD Protection for RF ICs in CMOS
Wang Albert;Lin Lin;Wang Xin;Liu Hainan;Zhou Yumei
..............page:628-636
Fabrication of n+ Polysilicon Ohmic Contacts with a Heterojunction Structure to n-Type 4H-Silicon Carbide
Guo Hui;Feng Qian;Tang Xiaoyan;Zhang Yimen;Zhang Yuming
..............page:637-640
Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing
Zeng Yugang;Han Genquan;Yu Jinzhong
..............page:641-644
An SIT-BJT Operation Model for SITh in the Blocking State
Yang Jianhong;Wang Zaixing;Li Siyuan
..............page:645-649
OTFT with Bilayer Gate Insulator and Modificative Electrode
Bai Yu;Khizar-ul-Haq;M.A.Khan;Jiang Xueyin;Zhang Zhilin
..............page:650-654
Optimization of a Thermoelectric Microwave Power Sensor
Han Lei;Huang Qing'an;Liao Xiaoping
..............page:789-793
A "Time Reuse" Technique for Design of a Low-Power, High-Speed Multi-Modulus Divider in a Frequency Synthesizer
Yuan Quan;Yang Haigang;Dong Fangyuan;Zhong Lungui
..............page:794-799
A CMOS Down-Converting Mixer For OFDM UWB Receivers
Hu Jiasheng;Li Wei;Li Ning
..............page:800-805
Accurate Parameter Extraction of Substrate Resistance in an RF CMOS Model Valid up to 20GHz
Zhao Yuhang;Hu Shaojian;Ren Zheng
..............page:737-740
Structural and Optical Properties of Amorphous MCT Films Deposited by RF Magnetron Sputtering
Kong Jincheng;Kong Lingde;Zhao Jun;Zhang Pengju;Li Hongzhi;Li Xiongjun;Wang Shanli;Ji Rongbin
..............page:733-736
A Passive NCITS 256 UHF RFID Transponder
Liu Zhongqi;Sun Xuguang;Bai Rongrong;Zhang Chun;Li Yongming;Wang Zhihua
..............page:719-723
Design and Implementation of an FDP Chip
Chen Liguang;Wang Yabin;Wu Fang;LaiJinmei;Tong Jiarong;Zhang Huowen;Tu Rui;Wang Jian;Wang Yuan;Shen Qiushi;Yu Hui;Huang Junnai;Lu Haizhou;Pan Guanghua
..............page:713-718
Top-Down Design of 260k Color TFT-LCD One-Chip Driver ICs
Wei Tingcun;Gao Wu
..............page:706-712
Design of a High Precision Array Pulse Sensor in TCM
Huai Yongjin;Han Zhengsheng
..............page:701-705
A High Precision CMOS Opamp Suitable for ISFET Readout
Zhang Chong;Yang Haigang;Wei Jinbao
..............page:686-692
A Novel Three-Section Self-Pulsating DFB Laser with Hybrid Grating
chen ding bo ; zhu hong liang ; liang song ; wang bao jun ; wang lu feng ; kong duan hua ; zhang wei ; wang huan ;sun yu; sun zuo ; zhang yun xiao ; wang lie song
..............page:682-685
An Ultra-Low Specific On-Resistance VDMOS with a Step Oxide-Bypassed Trench Structure
Duan Baoxing;Yang Yintang;Zhang Bo;Li Zhaoji
..............page:677-681
A Novel Equivalent Circuit Model of GaAs PIN Diodes
wu ru fei ;zhang haiying; zhang hai ying ; yin jun jian ; li zuo ; liu hui dong ; liu xun chun
..............page:672-676
1.01μm Gate-Length GaAs MHEMT Devices and SPDT Switch MMICs
Xu Jingbo;Li Ming;Zhang Haiying;Wang Wenxin;Yin Junjian;Liu Liang;Li Xiao;Zhang Jian;Ye Tianchun
..............page:668-671
The Convergence Characteristic of the Forward I-V Characteristic Curves of a Semiconductor Silicon Barrier at Different Temperatures
Miao Qinghai;Lu Shujin;Zhang Xinghua;Zong Fujian;Zhu Yangjun
..............page:663-667
A Novel AII-pMOS AC to DC Charge Pump with High Efficiency
Jiang Bowei;Wang Xiao;Min Hao
..............page:660-662
A High Purity Integer-N Frequency Synthesizer in 0.35μm SiGe BiCMOS
Zhang Jian;Li Zhiqiang;Chen Liqiang;Chen Pufeng;Zhang Haiying
..............page:655-659
Research and Implementation Process of a 42" PDP Scan Driver IC"
Hong Hui;Han Yan;Han Chenggong;Wang Yalin
..............page:806-810
Information for authors
..............page:813-814
Electrically Confined Aperture Formed by Ion Implantation and Its Effect on Device Optoelectronic Characteristics
Liu Cheng;Cao Chunfang;Lao Yanfeng;Cao Meng;Wu Huizhen
..............page:765-769
Substrate Current and Hot-Carrier-Injection in High Voltage Asymmetrical n-Channel MOS Transistor Technology
Dai Mingzhi;Liu Shaohua;Arthur Cheng;Li Hong;Andrew Yap;Wang Jun;Jiang Liu;Liao Kuanyang
..............page:757-764
5Study of a New Pattern of Omni-Directional Reflector AlGaInP Thin-Film Light-Emitting Diodes
Gao Wei;Zou Deshu;Li Jianjun;Guo Weiling;Shen Guangdi
..............page:751-753
A Two-Dimensional Subthreshold Current Model for Dual Material Gate SOI nMOSFETs with Asymmetric Halos
Luan Suzhen;Liu Hongxia;Jia Renxu;Wang Jin
..............page:746-750