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Chinese Journal of Semiconductors
0253-4177
2002 Issue 4
Ge Pre-Amorphization Silicide Process for Fully-Depleted SOI CMOS Devices
sun hai feng ; liu xin yu ; hai chao he ; xu qiu xia ; wu de zuo
..............page:445-448
Simulation of Anisotropic Etching of Silicon Based on MATLAB
zhang pei jun ; huang qing an
..............page:440-444
A Physical Model for Silicon Anisotropic Etching in KOH
jiang yan feng ; huang qing an ; wu wen gang ; hao yi long ; yang zhen chuan
..............page:434-439
Analysis of Static Capacitance Contrast for the IC Chip Irradiated by Low-Energy Electron Beam
feng ren jian ; zhang hai bo ;katsumi ura
..............page:428-433
Fabrication of Au-AlGaN/GaN HFET and Its Properties
zhang jin wen ; zuo gui zhen ; zhang tai ping ; wang zuo ; ning bao jun ; wu guo ying
..............page:424-427
Modeling on 2-D Direct Tunneling Current in Ultra-Thin Oxide nMOSFET's Considering Quantum Mechanics
chen li feng ; ma yu tao ; tian li lin
..............page:419-423
Effect of Surface State and S/D Resistance on Characteristics of 6H-SiC PMOSFET
zuo jin xia ; zhang yi men ; zhang yu ming ; tang xiao yan
..............page:408-413
Yield Analysis of GaAs DPDT Monolithic RF Switch for Wireless Communication
li fu xiao ; jiang you quan ; wu zhen hai ; xu zhong cang ; niu li rong ; zhou jian ming ; shao kai ; yang nai bin
..............page:403-407
Growth Rate Enhancement Factor for InP-Based Materials Narrow-Stripe Selective Area Metal-Organic Chemistry Vapor Deposition
zhang rui ying ; dong jie ; zhou fan ; feng zhi wei ; bian jing ; wang zuo
..............page:399-402
Influence of High Pressure Heat Treatment on Nucleation of Oxygen Precipitation at Low Temperature in CZ Silicon
xu jin ; yang de ren ; ma xiang yang ; li chun long ; zuo duan zuo ;a.misiuk
..............page:394-398
Annealing Effects on Oxygen-Rich Silicon Oxynitride
dan ya ping ; yue rui feng ; wang yan ; yao yong zhao ; xu yang ; liu li tian
..............page:388-393
Formation of Denuded Zone and Bulk Micro-Defects顾in Floating Zone Silicon
li chuan bo ; li huai xiang ; liu gui rong ; guo cheng hua ; zhang hua ; xue cheng shan
..............page:382-387
Electrical Characteristic of Oxygen-Related Donors in p-Type Czochralski Silicon
yu xue gong ; yang de ren ; ma xiang yang ; tang yan ; li dong sheng ; li li ben ; zuo duan zuo
..............page:377-381
Spontaneous Emission and Optical Gain in InGaAs Quantum Dots
ning yong qiang ; gao xin ; wang li jun ;peter smowton;peter blood
..............page:373-376
Effect of Neutral Traps on Tunneling Current and SILC in Ultrathin Oxide Layer
zhang he qiu ; mao ling feng ; xu ming zhen ; tan chang hua
..............page:367-372
Precision Bulk Micromachining Based on KOH Anisotropic Etching Using Ultrasonic Agitation
chen jing ; liu li tian ; li zhi jian ; tan zhi min ; jiang qian shao ; fang hua jun ; xu yang ; liu yan xiang
..............page:362-366
A Novel Lateral Solenoidal On-Chip Integrated Inductor Implemented in Conventional Si Process
liu chang ; chen xue liang ; yan jin long ; gu wei dong
..............page:352-356
A High Speed IGBT Based on Dynamic Controlled Anode-Short
yang hong qiang ; chen xing zuo
..............page:347-351
A Single Mode 980nm InGaAs/GaAs/AlGaAs Large Optical Cavity Quantum Well Laser with Low Vertical Divergence Angle
zhu xiao peng ; xu zun tu ; zhang jing ming ; ma zuo yu ; chen liang hui
..............page:342-346
Fabrication and Electrical Properties of Titanium Oxide by Thermally Oxidizing Titanium on Silicon
zhu zuo wen ; zhao bai ru ; liu xiao yan ; kang jin feng ; han ru zuo
..............page:337-341