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Etching of 4H-SiC Trench by Inductively Coupled Plasma
Hu Jinbao;Deng Xiaochuan;Shen Huajun;Yang Qian;Li Chengzhan;Liu Kean;Liu Xinyu;State Key Laboratory of Electronic Thin Films and Integrated Devices;University of Electronic Science and Technology of China;Microwave Device and IC Department;Institute of Microelectronics;Chinese Academy of Sciences;Semiconductor Business Unit;Zhuzhou CSR Times Electric Co.;Ltd;
..............page:570-574
..............page:575-579
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Heat Flux Characteristics of Linear Argon Plasma
Ou Wei;Cao Xiaogang;Xue Xiaoyan;Zhang Weiwei;Wang Jianqiang;Yang Dangxiao;Chen Chunli;Li Ying;Gou Fujun;Institute of Nuclear Science and Technology Sichuan University;College of Physical Science and Technology Sichuan University;Institute of Fusion Science Southwest Jiaotong University;
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