Chinese Journal of Vacuum Science and Technology 2015 Issue 1 Effects of Mo Buffer Layer on Properties of Mo/Cu Electrode Stack

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Chinese Journal of Vacuum Science and Technology
1672-7126
2015 Issue 1

Effects of Mo Buffer Layer on Properties of Mo/Cu Electrode Stack

..............page:1-5

First-Principles Calculationand Characterization of Optical Property of La-Doped SnO2 Coating

..............page:6-11

Impact of Sputtering Pressure on Li-W Co-Doped ZnO Thin Films

..............page:12-17

Properties and Application of Indium-Tin-Oxide Coatings Deposited by Energy Filtering Magnetron Sputtering at Room Temperature

..............page:18-22

Influence of Annealing Temperature on Microstructures and Optical Properties of CuGa0.8Ge0.2Se2 Films

..............page:23-26

Synthesis and Photocatalytic Properties of Ag-Modified N-Doped TiO2 Thin Films

..............page:27-32

Synthesis and Electrical Propertiesin 300 ～ 500℃ Range of YSZ/STO/YSZ-STO Superlattice Thin Films

..............page:33-37

Viscosity Correction of Rarefied Gas in Confinement Ring Based on Quadratic Optimization

..............page:38-43

Novel Type of Planetary Rotating Sample-Holder for Film Growth on Cylindrical Dewar by Vacuum Evaporation

..............page:44-48

Modeling andSimulation of Three-Nozzle Steam Jet Pump

..............page:49-56

Novel Technique to Rapidly Evaluate Precise-Volume of Irregularly-Shaped Container

..............page:57-61

Modeling and Calculation of Micro-Gripper Based on Vacuum Adsorption

..............page:62-68

Influence of Helium Permeation in Polytetrafluoroethene Gasket on Leak Detection

..............page:69-73

Impact of Heat Transfer on Pressure Response in Vacuum Chamber of Pneumatic Vacuum System

..............page:74-78

Novel Type of Highly Reliable Electric Heater for Thermal Cathode of Microwave Vacuum Electron Device

..............page:79-83

Photothermal Properties of Nanofluid in Direct Absorption Solar Collectors

..............page:84-88

Design Optimization of Confinement Ring in Reactive Ion Etching Reactor of 450 mm Silicon Wafer

..............page:89-99

Optimization of Cl2 and SF6 Flow Rates in Reactive Ion Etching of Amorphous-Si on Industrial Scale

..............page:100-104

Passivation of Polycrystalline Black Siliconby Plasma Enhanced Atomic Layer Deposition of Al2O3

..............page:105-108

Effect of Solid-Carbon Source Temperature on Graphene Growth by Chemical Vapor Deposition

..............page:109-113

Influence of Modulation Period on Mechanical Behavior of Ti-TiN-Zr-ZrN Multi-Layered Coatings

..............page:114-118

Calculation and analysis of computer chassis temperature field and flow field at different altitudes

..............page:119-124