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Vacuum
1002-0322
2009 Issue 2
Design and calculation of vacuum system for various electric furnaces
YANG Nai-heng;BA De-chun;WANG Xiao-dong;LIU Kun;YU Zhi-ming
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page:1-6
Study on aging kinetics of copper alloy during continuous heating
MA Xu;WANG Shun-xing;LIU Yong;ZHAN Yang;ZHAI Fu-qiang
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page:7-10
Numerical study on uniformity of potential difference distribution of parallel-plate electrodes in large-area PECVD reactor
GE Hong;ZHANG Xiao-Dan;ZHAO Jing;ZHAO Ying
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page:11-14
Influence of argon ion bombardment and sputtering power on the structure and properties of Cu thin film
ZHOU Xu-le;TANG Zheng-fang;JI Rui;SHENG Jiao
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page:15-18
Recent development of magnetron sputtering processes
YU Dong-hai;WANG Cheng-yong;CHENG Xiao-ling;SONG Yue-xian
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page:19-25
Large-aperture mirror coating and configuration of coating system
LV Li-dong
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page:26-28
Effect of annealing on structure and properties of Ti-doped hydrogen-free DLC films
XU Jun-qi;LI Chuan-zhi;YAN Yi-xin;LIU Heng-ping
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page:29-32
No. 16: Operation and maintenance of vacuum systems
ZHANG Yi-chen
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page:78-80
Analysis of thermal and exergy efficiencies of new-type trough-focus solar collector
XU Ji-fu;ZHU Yue-zhao;JIANG Jin-zhu;DONG Bao-Jun
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page:74-77
Method study on debase water loss in the process of vacuum cooling
CHEN Er-tong;XU Wen-qiang;XU Bin-kai;WANG Yan
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page:70-73
Trigger and switching-on trial of a field-breakthrough triggered vacuum switch
ZHOU Zheng-yang;LIAO Min-fu;DONG Hua-jun
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page:65-69
Basic characteristics of vacuum plasma antennas driven by single-pole surface wave
SUN Nai-feng;WANG Shi-qing;LI Jian;WEI Cao-lei
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page:60-64
Effect of design on performance of rotary plunger vacuum pump
HE Min-jian;TAO Yong-feng;WANG Xiao-hu;ZHENG Hui-ping;WANG Qin-fei;WANG Xi-long
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page:55-59
Improving vacuum in BEPCⅡ synchrotron radiation ring with titanium sublimation pump
XIAO Qiong;WANG Ya-ting;PENG Xiao-hua;DONG Hai-yi
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page:53-54
Numerical analysis of gas-liquid two-phase flow in liquid-ring vacuum pump
HUANG Si;RUAN Zhi-yong;DENG Qing-jian;WU Tai-zhong;TAN Zi-hua
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page:49-52
Effect of Technological parameters on deposition rate of ZAO films prepared by DC magnetron reactive sputtering
ZOU Shang-rong;WANG Hai-yan;GENG Mei-yan;MU Hui
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page:45-48
Applications of Si3N4 thin films and technological discussion on them
HE Jing-ci
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page:42-44
Effect of RF negative bias on structure and performance of DLC films prepared by ECR-RF-PECVD
SANG Li-jun;CHEN Qiang
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page:38-41
Effect of doped Ce3+ concentration on luminescent properties of Al2O3:Ce3+ films deposited by medium-frequency reaction magnetron sputtering
YAN Shao-feng;LUO Hong;LIAO Guo-jin;BA De-chun;LIU Si-ming
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page:33-37