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Vacuum
1002-0322
2007 Issue 3
xin xi san ze
..............page:11,15,23
No.15 :Jointing technique for vacuum engineering
ZHANG Yi-chen
..............page:78-80
An outgassing measuring system used at low temperature
YANG Chun-guang;XIAO You-ming;XU Lie
..............page:75-77
Preparation and application of soft magnetic ceramic target
XU Xiao-yu;HUANG Zhi-de;ZHAO Yu-tao
..............page:72-74
Review of recent studies on diagnoses based on arc plasma characteristics of vacuum switche arcing
DONG Hua-jun;CUI Yuan-hui;MAO Shu-qin;WANG Ren-li;ZHOU Zheng-yang
..............page:69-71
Development of heavy-current multi-torch plasma welding chamber
YANG Shi-jie;PENG Chang-hu;REN Yuan;LI Li
..............page:66-68
Short circuit elimination for grid components in ion rocket engine
ZHENG Mao-fan;JIANG Hao-cheng
..............page:56-59
On the terminal control system of vacuum toilet
LIU Xu-hua;ZHOU Jing-xuan;HU Guo-liang
..............page:54-55
Computerized control of substrate temperature during diamond film growth by HFCVD
CHU Xiang-qian;ZHU Wu;CHEN Chang-qi;ZUO Dun-wen;ZHU Yin
..............page:51-53
Automatic control system for desk freeze-dryer
JIANG Tao;OUYANG Xin-ping;CHOU Xin-ming
..............page:47-50
Application of mini-type zirconium getter pump in vacuum chamber
ZHANG Xiao-dong;ZHANG Guo-guang;QIU Meng-tong;SONG Ji-wen;LI Da-hai;CHEN Liang
..............page:43-46
Common vacuum fault diagnosis for MWVIP system
JIN Yu-fei
..............page:40-42
Constructional analysis of rotary piston vacuum pump and energy saving
WANG Guo-min;XU Tao;WANG Zai-en;ZHENG Hui-ping;LI Jin-wei
..............page:36-39
On the hysteresis loop in deposition of Al2O3 films prepared by medium-frequentcy reactive magnetron sputtering
LIAO Guo-jin;BA De-chun;WEN Li-shi;LIU Si-ming;YAN Shao-feng
..............page:32-35
Investigation on pulsed rapid photo thermal annealing of B-doped a-Si:H films
WANG Chang-zhou;YANG Shi-e;ZHAO Shang-li;WEN Shu-tang;LU Jing-xiao
..............page:28-31
Preparation of high-performance conductive thin films
ZHANG Shu-ren;CHEN Guo-liang;GUO tai-liang
..............page:24-27
Development of double-chamber UHV/CVD system
ZENG Yu-gang;HAN Gen-quan;YU Jin-zhong;Chen Bu-wen;ANG Qi-ming
..............page:19-23
Technological study on ZrN decorative thin films deposited by Medium-frequency reactive magnetron sputtering process
LI Xin-ling;XING Ya-zhou;YANG Yu-ying;SUN Wei-lian;ZHOU Zhi-nan
..............page:12-15
Coating technique for near UV cold -mirror reflector
YAO Chun-long;WANG Yin-he;ZHANG Hui
..............page:9-11
Prediction on the optimal geometry for off-axis sputtering process
DU Xiao-song;LI Jie;JIANG Ya-dong;XIE Guang-zhong;LI Wei;WANG Tao
..............page:5-8
Effect of Al content on properties of Ti1-xAlxN hard film prepared by unbalanced magnetron sputtering
ZHANG Yi-chen;YU Da-Yang;MA Sheng-ge;LIU Yan-wen;BA De-chun
..............page:1-4