Vacuum 2005 Issue 1 huan ying ding gou zhen kong za zhi shi ji guang pan

huan ying ding gou zhen kong za zhi shi ji guang pan
shen yang zhen kong za zhi she

..............page:61

qian zhi tong zhi
bao ying xian xing yuan dian re qi chang

..............page:49

qian zhi tong zhi
shen yang shi tian hong gong ye ji shu yan jiu suo

..............page:49

qian zhi tong zhi
shen yang san zhi huan zhen kong she bei you xian gong si

..............page:49

zhong guo tong yong ji xie zhen kong she bei dai ye xie hui di wu jie hui yuan da hui zai shen yang zhao kai
zhong tong xie zhen kong xie hui mi shu chu

..............page:32

shang hai fa men er chang gcq-900 qi dong gao zhen kong cha ban fa tong guo shang hai shi ji dian chan pin zhi liang jian ce zhong xin jian yan
shang hai fa men er chang

..............page:17

di ba jie guo ji zhen kong zhan lan hui jiang yu 2005 nian 10 yue 13 16 ri zai shang hai ju ban
chou zhan ban gong shi

..............page:14

zi bo zhen kong she bei chang you xian gong si 4 xiang xin chan pin tong guo sheng ji jian ding
zi bo zhen kong she bei chang you xian gong si zong shi ban gong shi

..............page:10

zhong guo zhen kong xue hui 2005 nian huo dong ji hua
zhong guo zhen kong xue hui ban gong shi

..............page:10

No.13:Check and measure technology for vacuum system
zhang yi chen

..............page:62-64

Maintenance of oil vapour diffusion vacuum pump
luo ding zuo

..............page:59-61

Some problems of constructional design of magnetofluidic sealing units
li guo yu

..............page:57-58

Analysis of the principle of thickness measurement of waveguide iris
zhao yi hong ; chen rong fa

..............page:25-27

Photocatalytic activity of nanometer TiO2 thin film by arc ion plating
ye chang jiang ; yuan yong ; li bi lian

..............page:22-24

Growth and properties of titanium dioxide film by DC reactive magnetron sputtering
yao ning ; zhang li wei ; lu zhan ling ; yang shi e ; fan zhi qin ; zhang bing lin

..............page:18-21

Vacuum deposition of nanometer TiO2 thin films by way of cathode arc discharge
zhou you su ; zhang li shan

..............page:15-17

Influence of substrate-to-target distance on optical property of TiO2 thin film prepared by DC reactive magnetron sputtering
wang he quan ; shen hui ; ba de chun ; wang bao wei ; wen li shi

..............page:11-14

Contemporary R&D trends in vacuum casting technology
wang xin ; xu cheng hai ; zhang yang

..............page:6-10

Sputtering deposition technology of photocatalytic TiO2 films
jiang zuo chang

..............page:1-5

Stress induced anisotropic diffusion during plasma-aided nitriding of a Ni-based superalloy
zou jian xin ; he huan ; chen bao qing ;thierry czerwiec;henri michel; dong chuang

..............page:53-56

Blistering due to secondary metallization of Ni-coating of ceramics applied to electronic vacuum
yang wei ying ; wu zhi ; zou gui juan ; zeng min

..............page:50-52

Development of vacuum chamber prototype in magnetic field for HIRFL-CSR project
heng chang sheng ; yang xiao tian ; zhang xi ping ; zhang jun hui ; meng jun

..............page:46-49

High target utilization plasma sputtering:a brand-new thin-film deposition technclogy
m.j.thwaites; wang xiao wei ; fang li wu

..............page:43-45

Design of calorimeter target for neutral beam injection system
he hui quan ; hu li qun ; hu chun dong ; gong jian hua

..............page:39-42

Research and manufacture of a multi-function arc ion plating unit
chen qing chuan ; tong hong hui ; cui xi rong ; liu xiao bo ; geng man ; wang jing quan

..............page:36-38

Computerized control of error sensibility and tolerance analysis
xia zhi lin ; xue yi yu ; ge chun qiao ; zhang you ling ; liu wei hua

..............page:33-35

Computer simulation for change of reflected color in film thickness control process
qi tong fei ; wu yong gang ; lin xiao yan ; tian guo xun ; wang yong

..............page:28-32