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Vacuum
1002-0322
2004 Issue 5
dian zi qiang yu li zi shu ji shu yi shu chu ban
shen yang zhen kong za zhi she
..............page:41-41
zhen kong gan zao yi shu yi chu ban fa xing
shen yang zhen kong za zhi she
..............page:31-31
qian zhi tong zhi
shen yang shi tian hong gong ye ji shu yan jiu suo
..............page:后单9
qian zhi tong zhi
bao ying xian xing yuan dian re qi chang
..............page:后单9
huan ying ding gou zhen kong
shen yang zhen kong za zhi she
..............page:64-64
gong ye jia re za zhi jie shao
gong ye jia re za zhi she
..............page:53-53
jia ting dian zi dian zi wen zhai bao da gai ban
jia ting dian zi za zhi she ; dian zi wen zhai bao she
..............page:37-37
No.13:Check and measure technology for vacuum system
zhang yi chen
..............page:61-64
Maintenance of oil vapour diffusion vacuum pump
luo ding zuo
..............page:59-60
Design of coiling coating system for foamed nickel sponge
li gui qin
..............page:54-55
New film-coating system and technology for large-size evacuated solar tube collectors
wei hai bo ; gou ying ; zhang jing yu
..............page:49-50
Application of magnetron sputtering plant with three cylindrical targets to decoration coating
ma sheng ge ; kang guang yu ; geng man
..............page:42-44
Comparative analysis of two patterns of end-Hall ion sources for ion beam-assisted deposition
pan yong qiang ; zhu chang ; fang yong ; si wa de ke fu si ji ; da si tan ke
..............page:38-41
Development of radioactive heater-crucible assembly for substrates
song chang an ; sun zhi wen ; li jian
..............page:35-37
Dry etching for high aspect ratio microstructures
wang xu di ; zhang yong sheng ; hu huan lin ; wang li
..............page:32-34
Application of PLC in ECR plasma facility
lv zuo ; cheng jian ; peng hui jun
..............page:29-31
Technology of thin-film thermistance microsensor
zhang yi chen ; ba de chun ; ma sheng ge
..............page:24-28
Effect of nitrogen ions implantated in high-speed steel substrate on c-BN thin film deposition
tan jun ; cai zhi hai ; zhang ping ; tang yun
..............page:19-23
Effects of N2 and Ar gases on performance of Cr thin film of photomask deposited by magnetron sputtering
chen chang zuo ; wang feng dan ; wang jun ; wang xu di ; gan shu yi ; hu xin yuan
..............page:15-18
Nanocrystalline silicon thin films deposited by low-temperature RF sputtering process and hetrojunction solar cell
zhao zhan xia ; cui rong qiang ; zhao bai chuan ; meng fan ying ; yu hua cong ; chen feng xiang ; zhou zhi bin
..............page:11-14
Study on mechanism of TiO2 nanofilm in application
wang he quan ; ba de chun ; shen hui ; wang bao wei ; chen da
..............page:7-10
Frontiers of advanced surface engineering/technology
wen li shi ; huang rong fang
..............page:1-6