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In situ photoemission study of interface and film formation during epitaxial growth of Er2O3 film on Si(001) substrate
ZHU Yanyan;FANG Zebo(Surface Physics Laboratory ,Fudan University, Shanghai 200433, China);LIU Yongsheng(Department of Mathematics and Physics, Shanghai University of Electric Power, Shanghai 200090, China;Surface Physics Laboratory ,Fudan University, Shanghai 200433, China);LIAO Can(Surface Physics Laboratory ,Fudan University, Shanghai 200433, China);CHEN Sheng(Surface Physics Laboratory ,Fudan University, Shanghai 200433, China)
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