Plating & Finishing 2009 Issue 3 Yttrium Doped TiO2 Films Prepared by DC Reactive Magnetron Sputtering

Journals A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

Plating & Finishing
1001-3849
2009 Issue 3

Yttrium Doped TiO2 Films Prepared by DC Reactive Magnetron Sputtering
ZHANG Wen-jie;ZHU Sheng-long;LI Ying;WANG Fu-hui;HE Hong-bo

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Preparation and Electrochemical Property of Copper Cobalt Hexacyanoferrate Hybrid Film
LI Hui;HAO Xiao-gang;DUAN Dong-hong;ZHANG Zhong-lin;MA Xu-li;LIU Shi-bin

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Preparation and Influence Factors of Porous Aluminum Anodizing Film
ZHANG Yong;FENG Hui;JIN Yuan-feng;YANG Yong;WU Xing-bing

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Research on Technology for Electroplating of Zn-Fe Alloy
ZHOU Xiao-rong;ZHANG Jia-wei;CHENG Si-qing;ZHANG Kai-cheng;XIONG Wei

..............page:13-15,21

Research Progress of Metallic Nano-particles Conductive Ink
ZHOU Rong-ming;CHEN Ming-wei;YIN Ren-he;YU Zu-zhan

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Study of Ni-P Alloy Electroless Plating on Boron Nitride Particles
ZHANG Lin-sen;GUI Yang-hai;YAN Li;WANG Wei

..............page:38-40

Influencing Factors in the Preparation of Titanium Dioxide Film
LIAN Bing-xian;QIU Wang-biao;YANG Lv;XU Bing

..............page:41-43