..............page:55-57,60
..............page:38-40,44
Optimization of Hop and Flu Spacers in HOPFED
zhong xuefei 1* ; wilbert van der poel 2; daniel den engelsen 2 and yin hanchun 1 (1.electronic engineering department; southeast university; nanjing; 210018; china; 2.lg.philips displays; product & process development; eindhoven; the netherlands)
..............page:11-16,24
Microwave Annealing in Titanium Silicidation
ouyang sike *; wang tao; dai yongbing; wu jiansheng; he xianchang and shen hesheng (thin film and microfabrication key laboratory of state education ministry; institute of micro/nanometer science & technology; shanghai jiaotong university; shanghai 200030; china)
..............page:58-60
Reactive Ion Etching of HfO_2 Films
wang xudi 1; 2 ; liu ying 1; hong yilin 1; fu shaojun 1* and xu xiangdong 1 (1.national synchrotron radiation lab; ustc; hefei 230026; china; 2.school of mechanical and automobile engineering; hfut; hefei 230009; china)
..............page:75-78
..............page:25-28,32
Technological Study of Fabrication of RF MEMS in Series
yu ying 1* ; luo zongzi 2; weng xinqiao 2 (1.department of electronic science and applied physics; fuzhou university; fuzhou; 350002; china 2.sa pen-tung microelectromechanical systems research center; xiamen university; xiamen; 360005; china)
..............page:68-70