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Vacuum Science and Technology
0253-9748
2004 Issue 4
bei yi qian zhi qi shi
..............page:67
Non-Destructive,Low Temperature Growth of Indium-Tin-Oxide Films on Flexible Organic Substrates by Electron Beam Evaporation
li shenglin *; feng kai; liu haoran; liu guohua and zhang dexian (department of electronic science and technology nankai university; tianjin 300071; china)
..............page:65-67
Formation of nc-Ge and nc-Si Particles in Ge-SiO_2 and Si-SiO_2 Thin Films
cheng juefei 1; 2 ; wu xuemei *1 and zhuge lanjian 1 (1.department of physics; suzhou university; suzhou; 215006; china; 2.suzhou vocational university; suzhou; 215006; china)
..............page:7-10
Electron Cyclotron Resonance Chemical Vapor Deposition System with Permanent-Magets
wu zhenyu *; liu yi; wang jiayou and yang yintang (institute of microelectronics; xidian university; xi an; 710071; china)
..............page:79-82
Critical Role of Contacts in Nanoelectronic Devices
hou shimin *; shen ziyong; zhao xingyu; xue zengquan and wu quande (department of electronics; school of electronics engineering and computer sciences; peking university; beijing; 100871; china)
..............page:3-6
ei hui yi jian xun
..............page:82
Ti-Si-N Coating on Slit Inner Walls by Plasma Enhanced Chemical Vapor Deposition
ma qingsong; ma shengli and xu kewei * (state-key laboratory for mechanical behavior of materials; xi an jiaotong university; xi an; 710049; china)
..............page:55-57,60
Spectral Matching Between Input Reflective Radiation of Objects and Super S_(25) & New S_(25)Photo Cathodes
liu lei * and chang benkang ** (nanjing university of science and technology; nanjing; 210094; china)
..............page:38-40,44
Optimization of Hop and Flu Spacers in HOPFED
zhong xuefei 1* ; wilbert van der poel 2; daniel den engelsen 2 and yin hanchun 1 (1.electronic engineering department; southeast university; nanjing; 210018; china; 2.lg.philips displays; product & process development; eindhoven; the netherlands)
..............page:11-16,24
Growth of WO_3 Electrochromic Films by Low Voltage Reactive Ion Plating
ren hao *; luo yuqiang; li xiaolin and bi jun (guangzhou research and development center of optics-mechanics-electricity engineering; guangzhou; 510635; china)
..............page:51-54
Development of Hall Ion Source for Film Growth by Ion Beam Assisted Deposition
you dawei *; ren jingxue; huang xiaogang and wu jianjun (space science and application research center; chinese academy of sciences; beijing; 100080; china)
..............page:41-44
Microwave Annealing in Titanium Silicidation
ouyang sike *; wang tao; dai yongbing; wu jiansheng; he xianchang and shen hesheng (thin film and microfabrication key laboratory of state education ministry; institute of micro/nanometer science & technology; shanghai jiaotong university; shanghai 200030; china)
..............page:58-60
Reactive Ion Etching of HfO_2 Films
wang xudi 1; 2 ; liu ying 1; hong yilin 1; fu shaojun 1* and xu xiangdong 1 (1.national synchrotron radiation lab; ustc; hefei 230026; china; 2.school of mechanical and automobile engineering; hfut; hefei 230009; china)
..............page:75-78
Development of Fluorinated Diamond-like Carbon Film
zhang ruzhi 1; liu guichang 1* and deng xinl 2 (1.institute of chemical engineering; 2.state key laboratory of material modification; dalian univ of technol; dalian; 116012; china)
..............page:33-37
Argon Plasma Generated by DC Glow and Magnetron Assisted Discharge: a Study of Spatial Resolved Optical Emission Spectroscopy
yu hong; zhang jialiang *; ren chunsheng; wang younian and ma tengcai (the state-key lab.of material modification by ion.laser and electron beams.dalian university of technology; dalian; 116023; china)
..............page:17-21
Etching of HfO_2 with Inductively Coupled Plasma of CHF_3,Ar,and H_2
xin yu *; ning zhaoyuan; ye chao; xu shenghua; gan zhaoqiang; huang song; chen jun and di xiaolian (institute of physics science and technology of suzhou university; the key thin film lab of jiangsu province; suzhou; 215006; china)
..............page:71-74
Dynamics Study of Al Extraction from Al_2O_3 by Al Sub-sulphidization
wu guoyuan *1 ; liu dachun 2 and dai yongnian 2 (1.dep.of material science and engineering; yunnan university; kunming; 650091; china; 2.dep.of metallurgy; kunming university of science and technology; kunming; 650093; china)
..............page:25-28,32
Vacuum Sealing of Sapphire Output Windows in High Power Microwave Device Fabrication
yuan guangjiang *; lu yuhua; luo jirun; yan xu; wu ersheng and guo hezhong (institute of electronics; chinese academy of sciences; beijing; 100080; china)
..............page:61-64
Microstructure and Properties of Ti-Si-N Nanocomposite Films Deposited by Reactive Sputtering
mei fanghua; shao nan; hu xiaoping; li geyang * and gu mingyuan (state key lab.of metal matrix composites; shanghai jiao tong university; shanghai; 200030; china)
..............page:29-32
Technological Study of Fabrication of RF MEMS in Series
yu ying 1* ; luo zongzi 2; weng xinqiao 2 (1.department of electronic science and applied physics; fuzhou university; fuzhou; 350002; china 2.sa pen-tung microelectromechanical systems research center; xiamen university; xiamen; 360005; china)
..............page:68-70
Growth of Diamond Thin Films with Smooth Surface and High Transmittance on Quartz Glass Substrates
hao tianliang 1; 2 ; shi chengru 1* and han gaorong 2 (1.central lab.2.department of material science; zhejiang university; hangzhou; 310028; china)
..............page:45-50
Surface Diffusion in Annealing of SrTiO_3 Film Grown by Laser Molecular Beam Epitaxy
wei xianhua; zhang ying; deng xinwu; huang wen; li jinlong and li yanrong * (school of microelectronics and solid-state electronics; university of electronic science and technology; chengdu; 610054; china)
..............page:22-24