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Study on Structure and Optical Properties of Ge-SiO_2 Films Prepared by RF Sputtering
luan cai-xia 1; 2 ; chai yue-sheng 1; 3 ; sun gang 1; ma zhi-hua 1; zhang min-gang 1; 4 (1.taiyuan university of science and technology; taiyuan 030024; china; 2.jinan iron & steel group general corporation; jinan 250101; china; 3.shanghai university; shanghai 200072; china; 4.institute of solid state physics; the chinese academy of science; hefei 230031; china)
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