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Journal of Vacuum Science and Technology
1672-7126
2011 Issue 4
Growth of Aluminum Electrode and Alumina Dielectric Layer for Plasma Display Panel
Liu Qifa;Wang Yan;Wang Hong;Ding Guifu
..............page:419-423
Measurement of Extremely Low Gas Flow
Li Detian;Feng Yan;Cheng Yongjun;Zhang Dixin;Guo Meiru
..............page:435-439
Growth and Optical Properties of Pulsed Laser Deposited SnS Films
Li Lili;Liang Qi;Shi Chengwu;Kong Mingguang;Li Bing
..............page:386-392
Simulation of RF Impedance Matching of Magnetron Sputtering Based on Genetic Algorithm
Wang Hongbo;Huang Wen;Chen Changqi
..............page:500-504
Newly-Developed Power Supply Control Unit for Plasma Generator of Neutral Beam Injector
Chen Changqi;Wang Gensheng;Liu Zhimin;Song Shihua
..............page:440-443
Production of 5N Copper by Directional Solidification and Electron Beam Refining
Chen Jie;Fu Yabo;Liu Ning;Lu Yiping;Li Tingju
..............page:495-499
Mechanism Analysis and Simulation of Vacuum Agitating Deaeration of High Viscosity Liquids
Liu Xiaobo;Zhang Jianrun;Li Pu;wang xinhua
..............page:444-448
Impacts of Growth Conditions on Microstructures and Mechanical Properties of ZrB2/AIN Multilayers
Gong Jie;Liu Menyan;Wang Haiyuan;Xue Fengying;Yan Jingyue;Zhang Shuai;Wang Hui;Li Dejun
..............page:453-458
Possible Reaction Paths of Silica in Vacuum Extraction of Aluminum by Fluoridization
Li Qiuxia;Liu Yongcheng;Jin Bi;Yang Bin;Dai Yongnian
..............page:490-494
Growth of CrN Films by Plasma Ion Implantation & Deposition Based on High Power Pulsed Magnetron Discharge
Wu Zhongzhen;Tian Xiubo;Wang Zeming;Gong Chunzhi;Yang Shiqin
..............page:459-464
Surface Modification of Cast Titanium Used as Denture Framework
Tong Yu;Guo Tianwen;Wang Jing;Liang Haifeng;Mi Qian
..............page:402-405
Dynamical Simulation of Modification of Inner Surfaces of Square Tubes by Plasma Ion Implantation
Wang Zhijian;Tian Xiubo;Gong Chunzhi;Yang Shiqin;Ricky Fu
..............page:470-475
Growth and On-Line Stress Evaluation of TiO2 and SiO2 Films
Leng Jian;Xue Wei;Yu Zhinong;Lu Weiqiang;Wang Huaqing;Zhang Dongpu
..............page:465-469
Oxidation Resistance of Novel Ag-Based Cr/Cu/Ag/Cu/Cr Composite Film Electrodes
Weng Weixiang;Jia Zhen;Yu Guanglong;Li Yu;Guo Tailiang
..............page:381-385
Quantum Efficiencies of Transmission-Mode GaN Photocathode under Front and Back mumination
Du Xiaoqing;Zhong Guangming;Tian Jian
..............page:397-401
Diagnosis of Glow Discharge Plasma with Langmuir Probe in Growth of Magnetron Sputtered a-Si:H Film
Li Hongtao;Jiang Bailing;Yang Bo;Cao Zheng;Guo Weihua;Jiao Dongmao
..............page:476-480
Latest Development of Heat Dissipation of Slow-Wave Structure in Helix Traveling Wave Tube
Liu Yanwen;Han Yong;Liu Pukun;Zhang Lianzheng;Lu Yuxin
..............page:424-434
Design of Plasma Source Dedicated to Active Protection from Space Radiation
Jia Xianghong;Xu Feng;Wan Jun;Jia Shaoxia;Wang Shouguo
..............page:481-484
Influence of O2/Ar Flow Ratio on Microstructures and Photoluminescence of ZnO Films
Wang Xiaoxiao;Xia Qiping;Lü Jianguo;Song Xueping;Sun Zhaoqi
..............page:393-396
Energy Efficiency Evaluation of Water-Ring Vacuum Pumps
Xu Fajian;Lei Chundong;Liu Baoxin;Sun Meng
..............page:449-452
Behavior of Fe2O3 in Al Extraction by Alumina Carbothermic Reduction-Chlorination in Vacuum
Zhu Fulong;Yu Oingchun;Yang Bin;Yuan Haibin;Xu Baoqiang;Dai Yongnian
..............page:485-489
Development of Repetitive Pellet Injector with Screw Extruder in HL-2A TOKAMAK
Xu Hongbing;Liu Dequan;Zhu Genliang;Wang Mingjian
..............page:510-513
Parasitic-Mode-Suppression in TM310-Mode Coaxial Resonator of Multiple-Beam Klystron
Han Huipeng;Wang Yong;Zhang Rui
..............page:413-418
Localized Pumping and Wall-Thickness Uniformity of Hollow Industrial Work-Piece Produced by Extrusion Blow Molding
Huang Hong;Wang Xuanlun;Dai Bing;Wang Haimin;Li Nengwen
..............page:505-509