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Vacuum Science and Technology
0253-9748
2011 Issue 3
Molecular Dynamics Simulation of H-Etching of Hydrocarbon Films in Fusion Reactor
Lü Xiaodan1;Qin Youmin1;2;Zhao Chengli1;Ning Jianping1;2;He Pingni1;Gou Fujun3;4
..............page:320-325
Surface Modification of Aerospace Flywheel-Bearings by Nitrogen Plasma Immersion Ion Implantation
Li Zhaoguang1;2;Zhang Renji2;Yang Yu2;Wang Langping3
..............page:326-329
Influence of Substrate Material on Growth of ZnS Films
Xu Junqi;Su Junhong;Liang Haifeng;Xi Yingxue
..............page:262-266
Corrosion Resistance Enhancement of Ceramic Membranes Deposited by Chemical Vapor Deposition
Huang Bensheng1;2;Xue Qi2;Jiang Zhongying2;Liu Qingyou1
..............page:348-351
Sputtering Power and Microstructures of RF Reactively Sputtered Ag2O Films
Ma Jiaomin1;Liang Yan2;Gao Xiaoyong1
..............page:283-286
Molecular Dynamics Simulation of Energy Dependence of SiF2 and SiC Interaction
Zhao Chengli1;2;Qin Youmin1;Lü Xiaodan1;Ning Jianping1;He Pingni1;Gou Fujun3;4
..............page:376-380
Growth and Stress Distributions of Negative Thermal Expansion ZrW2O8 Films Deposited by RF Magnetron Sputtering
Liu Hongfei1;Zhang Zhiping2;Zhang Wei1;Chen Xiaobing1;Cheng Xiaonong3
..............page:253-257
Improvement of Magnetic Fluid Sealing of Film Depositors with Double Shafts
Xing Feifei;Li Decai
..............page:362-367
Thermoelectric Property of Different Thickness ZnO Films Grown by Gas Discharge Activated Reaction Evaporation
Sun Haitao1;Li Chengwu1;Lu Hui1;Fang Bin2;Lin Xian1;Wang Yannan3;Pan Xiaoren1
..............page:292-296
Optimization of Luminance and Luminous Efficiency of Mercury-Free Flat Fluorescent Lamps
Liu Zhen;Hu Wenbo;Sun Yongkui;Liu Chunliang
..............page:309-313
Polishing of B-Doped Diamond Films by Electrical Discharge Machining
Chu Xiangqian1;Zuo Dunwen2
..............page:287-291
Characterization of Highly-Aligned ZnO Nanowire Arrays and Its Application in Humidity Sensors
Gu Leilei;Zheng Kaibo;Sun Dalin;Mo Xiaoliang;Chen Guorong
..............page:352-356
Electron Trajectories in High-Harmonic Slotted Peniotron
Zhao Xiaoyun;Li Jiayin;Hu Biao;Wu Xinhui;Li Tianming
..............page:297-304
Influence of C2H2 Flow Rate on Microstructures and Electronic Properties of SiCN Diffusion Barriers
Zhang Zhichao;Zhou Jicheng;Peng Yinqiao
..............page:272-277
Evaluation of High Temperature Outgassing Rates of Stainless Steel in Method of Switching between Two Pumping Paths
Guo Dizhou1;2;Zhang Junhui1;Meng Jun1;Yang Xiaotian1;Luo Cheng1; Yang Weishun1;Zhao Yugang1;Hu Zhenjun1;Hou Shengjun1
..............page:368-371
The Carbothermic Reduction Process for Magnesium Removal from Nickel Laterite in Vacuum
Xu Baoqiang1;2;3;Pei Hongbin1;Yang Bin1;2;3;Liu Dachun1;2;3;Qu Tao1;2;3;Dai Yongnian1;2;3
..............page:341-347
Growth and Oxidation Resistance of ZnO:Sn/Ag/ZnO:Sn Composite Film Electrodes
Li Yu;Yuan Junlin;Weng Weixiang;Wu Chaoxing;Jia Zhen;Guo Tailiang
..............page:258-261
Growth and Characterization of Indium-Tin-Oxide Films by Energy Filtered DC Magnetron Sputtering
Yao Ning1;2;Chang Lihong2;Han Changbao2;Xing Hongwei2;Ge Yashuang2;Cui Nana2;Wang Yingjian1;Zhang Binglin2
..............page:278-282
Influence of Ne-Xe Gas Mixture on Discharge of Shadow Mask Plasma Display Panels
Zhu Di;Zhang Xiong;Fan Zhaowen;Yang Lanlan;Tu Yan;Li Qing;Kuang Yawei;Wang Baoping
..............page:330-335
Characterization of Superfine Copper Powders Grown By Vacuum Evaporation
Shi Shengdian1;2;Yang Bin1;2;Xu Baoqiang2;Xiong Heng2;Dai Yongnian1;2
..............page:336-340
Emission Characteristics of 411 Aluminates in Ba-W Cathode
Tang Zhilan1;Shen Chunying1;Li Zhishun2;Qiu Tai1
..............page:305-308
Novel Power Supplies for Plasma Implantation by Direct Coupling of RF and 40 kV Pulsed Voltages
Gong Chunzhi;Tian Xiubo;Zhu Zongtao;Yang Shiqin
..............page:357-361
Comparison of Address Voltage Margins under Two Novel Driving Waveforms in Shallow Mask Plasma Display Panels
Yang Cheng;Zhang Xiong;Wu Zhong;Fan Zhaowen;Ruan Guifu
..............page:314-319
Influence of Substrates on Hydrogenated Si Films Grown by Plasma Enhanced Chemical Vapor Deposition
Wang Quan1;2;Hu Ran1;Ding Jianning1;He Yuliang3
..............page:267-271