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Vacuum Science and Technology
0253-9748
2005 Issue 1
Formation of Nano-Grains in Amorphous Co-Nb-Zr Films and Its Magnetic Properties
jiang xiangdong *; zhang huaiwu; wen qiye and shi yu (school of microelectronics and solid state electronics; university of electronic science and technology of china; chengdu; 610054; china)
..............page:41-44
Influence of N_2 Partial Pressure on Microstructure and Mechanical Properties of Reactively Sputtered (Ti,Al)N Films
mei fanghua; shao nan; wei lun and li geyang * (state key lab.of metal matrix composites; shanghai jiao tong university; shanghai; 200030)
..............page:65-68
Influence of Electrode on Discharge Characteristics in Newly-Developed Shadow-Mask Plasma-Display Panel:a Simulation Study
zhang jian; tu yan * and yin hanchun (department of electronic enqineering; southeast university; nanjing; 210018; china)
..............page:8-13
Photoemission Spectroscopy Studies of Tetracene Overlayer on Ag(110)
tao yongsheng; zhang hanjie; l bin; huang han; li haiyang; bao shining and he pimo * (department of physics; zhejiang university; hangzhou; 310027; china)
..............page:5-7,21
Development of 2nd Generation Proximity Focus Image Intensifier with Nano Second Response
xu jiangtao (xi an institute of applied optics; xi an; 710100; china)
..............page:51-53
bei yi qian zhi qi shi
..............page:78
Photocatalytic Ag-TiO_2 Thin Films Prepared by RF Magnetron Co-Sputtering
shen jie; cai zhenwei; wo songtao; cui xiaoli; ren dasen; yang xiliang and zhang zhuangjian * (department of materials science; fudan university; shanghai; 200433; china)
..............page:37-40
Al-induced Crystallization of Hydrogenated Amorphous Silicon Films
qi jing; jin jing; hu hailong and he deyan * (department of physics; lanzhou university; lanzhou; 730000; china)
..............page:61-64
Preferred Crystal Orientation of Mg-Zr-O Composite Protective Layer Prepared by E-beam Evaporation
guo bingang; liu chunliang *; liu liu; fan yufeng and xia xing (key laboratory for physical electronics and devices of the ministry of education of china; xi an; 710049; china)
..............page:57-60
Atomic Force Microscopy Study of Bismuth Films and Its Electrical Properties
xu jianfeng; zhang jianhua; li haiyang *; he pimo and bao shining (department of physics; zhejiang university; hangzhou; 310027; china)
..............page:30-33
Simulation of X-ray Lithography Mask Distortion in Device Fabrication
wang yongkun; yu jianzu * and yu lei (school of aeronautics science and technology; beijing university of aeronautics and astronautics; beijing; 100083; china)
..............page:22-24,33
Low Throughput Calibration by Constant Volume and Conductance Technique
zhang dixin *; guo meiru; feng yan; zhao lan; li detian; zhao dingzhong; li zhenghai; cheng yongjun; li li; gong yueli and sun hai (lanzhou institute of physics; lanzhou; 730000; china)
..............page:25-29
Silicon Carbide Nanowires Synthesized by Arc Discharge
wu xufeng * and ling yiming (dept.of electronical engineering; southeast university; nanjing; 210018; china)
..............page:34-36
zhong guo zhen kong xue hui
..............page:2
Development of Diamond-Like Carbon Coating Technology for Magnetic Storage Disk
ding wanyu; gao peng; deng xinlu *; dong chuang and xu jun (state key laboratory of material modification by laser; ion; electron beams; dalian university of technology; dalian; 116024; china)
..............page:45-50,53
Measurement of Characteristics Parameters of AC Plasma Display Panel
liang zhihu; liu chunliang * and liu zujun (key laboratory for physical electronics and devices of the ministry of education; xi an jiaotong university; xi an 710049; china)
..............page:18-21
Interfacial Strain in Heteroepitaxial Growth of MgO/STO Thin Film
zheng liang; zhang ying *; li jinlong; jiang shuwen; ji hong; ai wanyong; chen yin and li yanrong (school of microelectronics and solid-state electronics; university of electronics science and technology of china; chengdu; 610054; china)
..............page:14-17
kan deng guang gao xie yi shu
..............page:83
Influence of Sb Dopant in TiO_2 Film Growth by DC Reactive Magnetron Sputtering
cai zhenwei; wo songtao; shen jie; cui xiaoli; yu hongkun; yang xiliang and zhang zhuangjian * (dept.of materials science; fudan university; shanghai; 200433; china)
..............page:54-56
Growth of TiN Film by Modified Ion Beam Enhanced Magnetron Sputtering
dong qi; luo rongping; zhang shouzhong; du jian; zhong gang; tian kai; wen xuechun and liu xiangwu (prochina limited; beijing; 100096; china)
..............page:73-78
Influence of Total Gas Pressure on Optical Property of TiO_2 Thin Film Grown by DC Reactive Magnetron Sputtering
wang hequan 1; 2 ; ba dechun 1; shen hui *3 ; wang baowei 4 and wen lishi 5 (1.northeastern university; shenyang 110004; china; 2.shenyang agricultural university; shenyang 110161; china; 3.sunyat-sen university; guangzhou 510275; china; 4.guangzhou institude of energy conversion; guangzhou 510070; china; 5.institute of metal research chinese academy of sciences; shenyang 110016; china)
..............page:69-72
Development and Applications of A New Si Electron Beam Evaporator
wang kefan 1; liu jinfeng 1; zou chongwen 1; xu pengshou 1; pan haibin 1; zhang xigeng 2 and wang wenjun 2 (1 national synchrotron radiation laboratory; university of science and technology of china; hefei; 230029; china; 2 shenyang juzhi technology company limited; shenyang; 110003; china)
..............page:79-82