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Vacuum Science and Technology
0253-9748
2003 Issue 2
Atomic Force Microscopy Study of Surface Roughening of Au/NiCr/Ta Multilayers in Microwave Integrated Circuits
tang wu *; xu kewei *(state key laboratory for mechanical behavior of materials xi an jiaotong university; xi an; 710049; china)wang ping; li xian(the xi an institute of space radio technology; xi an; 710000; china)
..............page:72-74
Microstructures and Physical Properties of Al_2O_3 FilmsSynthesized by lon Beam Assisted Deposition
zhang qingyu *; zhao wenjun; wang pingsheng(state key laboratory for materials modification by laser; ion and electron beams; dalian university of technology; dalian; 116024; china)wang liang; xu jiujun(institute of materials technology; dalian maritime university; dalian; 116024; china)chu paul k.(department of physics and materials science; city university of hongkong; 83 tat chee avenue; kowloon; hongkong; china)
..............page:55-60
Studies of Dead Layer and Reactions at Interfaces of Ta/NiFe and NiFe/Ta
zhao hongchen 1; yu guanghua 2; si hong 31 microelectronics center; chinese academy of science; bejing; 1000292 department of materials physics; university of science and technology beijing; beijing; 100083 3 central iron and steel research institute; beijing; 100081; china
..............page:20-22,71
Influence of Sustaining Pulse-Width and Driving Frequency on DischargeCharacteristics of AC Plasma Display Panels
du chunyan; liang zhihu; liu chunliang *(key laboratory for physical electronics and devices of the ministry of education; xi an jiaotong university; xi an; 710049; china)
..............page:39-42
Future Vision of Vacuum Science and Technology in 21st Century
chikara hayashi(ulvac inc.2500 hagizono; chigasaki; kanagawa; japan)
..............page:28-32
Growth of Magneto-optic Ce-substituted YIG Thin Films on AmorphousSilica Substrated by RF Magnetron Sputtering
wang wei; lan zhongwen; wang haocai; (institute of microelectronics and solid state electronics; uestc; chengdu; 610054; china)gao nengwu; qin yueli; kong xiangdong(no.29 institute of me; chengdu; 610036; china)
..............page:48-51
Calculation of Field Emission of Carbon Nanotubes
hu chenguo; yang nan; wang le; wang wanlu(college of math.and phys; chongqing university; chongqing; 400044; china)
..............page:43-47
Growth of Polycrystalline GaN on Silica Substrate via Ga Nitridation
shao qinghui; ye zhizhen; nasser n.morgan; gu xing; huang jingyun; zhao binghui(state key laboratory of silicon materials; zhejiang university; hangzhou; 310027; china)
..............page:52-54
Line Repetition Technology of Color Plasma Display Panel
liang ning; shen sikuan; sun jian(institute of physical electronics and devices; xi an jiaotong university; 710049; china)
..............page:17-19,27
Interfacial Microstructures of SnO_2/Fe_2O_3 Bilayer andIts Influence on Gas-Sensitivity of SnO_2
ma xiaocui 1; yan dawei 2; zhao yongsheng 2(1 department of materials science and engineering ; school and science shenzhen university; shenzhen; 518060; china; 2 college of electronics and engineering; jilin university; changchun; 130023; china)
..............page:11-16
Study of Impendence Transition for Bistable Thin Film
jiang yiming; wan xinggong; xie hengbo; li jin; hua zhongyi(department of materials science; fudan university; shanghai; 200433; china)
..............page:8-10,16
New Convergence Measurement System of Color Cathode Ray Tube
li xiaohua; yang xiaowei; wang qilong; chen fuchao; jia litao(department of electronic engineering; southeast university; nanjing; 210018; china)
..............page:5-7
Influence of External Magnetic Field on Utilization Ratio ofTarget Materials in Magnetron Sputtering
zhao xinmin; di guoqing; zhu yan(physics department; suzhou university; suzhou; 215006; china)
..............page:36-38
Experimental Study of Effect of Atomic Oxygen Erosion on Rubber O-ring
shao xinjie; zhang jainbin; zhou rusheng(beijing univ.of aeronautics and astronautics; college of mechanical engineering and automatization; beijing; 100083; china)
..............page:68-71
Cracking of Color Picture Tube in Evacuating Furnace
qi changzheng(dept of mech.& elec.engineering; guangdong light industry technical college; guangzhou 510300; china)
..............page:75-78
DDVP Photocatalytic Degradation of TiO_2 Films Grownby Mid-Frequency Reactive Magnetron Sputtering
zhao ming; zhuang daming; zhang gong; fang ling; wu minsheng; liu jiajun(functional thin film division; department of mechanical engineering; tsinghua university; beijing; 100084; china)
..............page:64-67
Surface Modification of H13 Steel by Arc Deposition of Al Film andHigh Current Pulsed Electron Bombardment
zou jianxin; wu aimin; liu zhenmin; li maoyuan; dong chuang(state key lab.for materials modification; dalian univ.of technology; dalian 116024; china)
..............page:23-27
Studies of Energy Resolution of Electron Spectroscopy and Channeltron Characteristics Using Elastic Secondary Electrons
wu zhenglong(analytical and testing center; beijing normal university; 100875; china)
..............page:33-35
Influence of Oxygen Pressure on Growth of c-Oriented LiNbO_3 Filmson Silicon by Pulsed Laser Deposition
wang xinchang 1; ye zhizhen 1; he junhui 2; huang jingyun 1; gu xing 1; lu huanming 1; zhao binhui 1(1 the state key laboratory of silicon material; zhejiang university; hangzhou; 310027; china; 2 department of physics; zhejiang university; hangzhou; 310027; china)
..............page:61-63,67